This novel method allows lithographyfree fabrication of the sinw and sinh arrays with control of the size and distribution. Pdf nanoimprint lithography nil is a compelling technique for low cost nanoscale device fabrication. Strategies to obtain pattern fidelity in nanowire growth. Fabrication of single nanowire device using electron beam. Nanoimprint boasts financial benefits as the setup, maintenance and running costs involved are a fraction of the ebl equivalent. This procedure, termed onwire lithography, combines advances in templatedirected synthesis of nanowires with electrochemical deposition and wetchemical etching and allows routine fabrication of facetoface disk arrays and gap structures in the range of five to several.
Nanoimprinting techniques for polymeric electronic. Nanoimprintlithography patterned epitaxial fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies wei zhang,1 mark e. Templated fabrication of nanowire and nanoring arrays. We demonstrate the use of nanoimprint lithography to define arrays of vertical inp nanowires. Nanoimprint lithography the past, the present and the future article pdf available in current nanoscience 126. Nearunity broadband absorption designs for semiconducting nanowire arrays via localized radial mode excitation katherine t. Nanowire arrays defined by nanoimprint lithography nano letters.
Montelius l, seifert w and samuelson l 2004 nanowire arrays defined by nanoimprint lithography nano lett. Furthermore, the metal nanowires with different widths and heights can be generated by adjusting the imprinting. C sem image of an expanded view of one square array. Metalassisted chemical etching, silicon nanowire arrays, silicon nanohole arrays, silver. Fabrication of periodic metal nanowires with microscale. A schematic illustration of the approach for hierarchical patterning of nanowire lithographically defined structures. Fabrication of single nanowire device using electron beam lithography a thesis submitted in partial fulfillment of the requirements for the degree of master of science in electrical engineering by thach pham university of arkansas bachelor of science in electrical engineering, 2011 may 2014 university of. Generic nanoimprint process for fabrication of nanowire. The length of these nanowires can be easily controlled from micrometres to.
In this paper, a simple method is demonstrated for fabricating periodic metal nanowires based on the unconventional nanoimprint lithography nil technique. Ondemand fabrication of sisio 2 nanowire arrays by. Ag mesh with holes and semispherical ag nanoparticles can be prepared by simple thermal annealing of ag thin film on a silicon substrate. Highly organised and dense vertical silicon nanowire.
Figure 2 sem micrographs of nil defined inp nanowire arrays as obtained after growth. Resist filling study for uv nanoimprint lithography using. Nanoimprint lithography5 and transfer lithography6,7 can also pattern substrates down to the nanoscale and, in contrast to. Journal of crystal growth 287 2006 3438 wellordered zno nanowire arrays on gan substrate fabricated via nanosphere lithography hong jin fana, bodo fuhrmannb, roland scholza, frank syrowatkab, armin dadgarc, alois krostc, margit zachariasa amax planck institute of microstructure physics, weinberg 2, 06120 halle, germany bthe interdisciplinary center of materials science, hoher.
Nano express open access lithographyfree fabrication of. In this work, nanoimprint lithography combined with standard anodization etching is used to make perfectly organised triangular arrays of vertical cylindrical alumina nanopores onto standard. Using this method, sub100 nm metal nanowires with the rectangular crosssection are fabricated with microscale stamp. We demonstrate the use of nanoimprint lithography to define. Improved sensing characteristics of dualgate transistor sensor using silicon nanowire arrays defined by nanoimprint lithography. Nanoimprint lithography can be defined as the use of a mold to define nanoscale deformation of a resist, which is then cured either by heat or uv.
D afm image of seven line features recorded from one array. Each nanowire is individually seeded from a catalyzing gold particle and then grown via vapor. However, uvnil has established itself as a promising alternative to nil in which imprint lithography is. Generic nanoimprint process for fabrication of nanowire arrays aurelie pierret 1, moira hocevar 1,2. The ones marked may be different from the article in the profile. Consequently, nanowire arrays with uniform size can be readily obtained by using monodispersed metal nanoparticles 20. Nanowire arrays defined by nanoimprint lithography american. Optical absorption of compositiontunable ingaas nanowire. High density gaas nanowire arrays through substrate. Improved sensing characteristics of dualgate transistor. Request pdf nanowire arrays defined by nanoimprint lithography we demonstrate the use of nanoimprint lithography to define arrays of vertical inp nanowires. We demonstrate the fabrication of the largearea arrays of vertically aligned sisio 2 nanowires with full tunability of the geometry of the single nanowires by the metalassisted chemical etching technique and the following thermal oxidation process.
Pdf nanoimprint lithography for nanodevice fabrication. Here, we report a systematic investigation of the optical absorption characteristics of compositiontunable vertical ingaas nw arrays. Sparse nanoimprint lithography to define arrays of vertical inp nanowires. Sinh arrays matched well with that of ag holes and nanoparticles. Thus, we are moving towards a lithography process that incorporates standard cmos bulkprocessing techniques to attain higher throughput and more repeatable results. Stepandrepeat nanoimprint, photo and laser lithography.
Nanowire nw arrays could provide substantial reductions in material consumption as well as production costs for iiivbased solar cells, in part because they can be monolithically grown on low. Optical micrograph of integrated metal electrode arrays deposited on top of patterned parallel nanowire arrays defined by photolithography. Nanoimprint lithography patterned epitaxial fe nanowire. We report a highthroughput procedure for lithographically processing onedimensional nanowires. Positioncontrolled uniform gaas nanowires on silicon. Pdf nanoimprint lithography the past, the present and.
Fabrication of periodic metal nanowires with microscale mold by nanoimprint lithography. Ordered silicon nanowire arrays via nanosphere lithography. Both the pore diameter and the period of alumina porous array are well controlled and can be tuned. Lithographyfree fabrication of silicon nanowire and. Nanohole patterns are defined in a sio2 mask on 2 in. To fabricate the geometry controllable sisio 2 nanowire nw arrays, two critical issues relating with the size control of polystyrene. The diameter and position of each nanowire can be controlled to create engineered arrays, demonstrated with a hexagonal photonic. Nanoparticles can be synthesized chemically or biologically. Nanoimprintlithography patterned epitaxial fe nanowire. Corn department of chemistry, university of californiairvine, irvine, california 92697, united states.
Krishnan1,a 1department of materials science and engineering, university of washington, seattle, washington 98195, usa 2environmental molecular science laboratory, paci. Hierarchical parallel nanowire arrays were also prepared and used as masks to define nanometer pitch lines in 10. Nearunity broadband absorption designs for semiconducting. Nanoimprint lithography patterned epitaxial fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies wei zhang,1 mark e. To optimize the yield of vertical nws the mbe growth parameter space is tuned, including ga predeposition. According to this input wires state, all the other magnets orient themselves. Spontaneous formation of localized etch pits is observed when the galvanic reaction is constrained to lithographydefined substrate regions, which confines smalldiameter au nanoparticles during the high temperature growth of gaas nanowire arrays and enables epitaxial growth of. This cited by count includes citations to the following articles in scholar. Published 8 january 2010 iop publishing ltd nanotechnology, volume. Twodimensional silica colloidal crystal template is used to create metal nanohole arrays on a silicon surface, which enables the controlled fabrication of aligned silicon nanowire sinw arrays vi. Au nanowire or nanoring arrays have been prepared by selective electrochemical deposition on the step edges.
However, this method is expensive and lowthroughput. B sem image showing the massive square arrays of parallel lines. Show full abstract three different strategies to improve pattern preservation of largearea catalyst particle arrays defined by nanoimprint lithography for nanowire growth. Here, we explore three different strategies to improve pattern preservation of largearea catalyst particle arrays defined by nanoimprint lithography for nanowire growth. Nanoimprint lithography for nanodevice fabrication nano. Silicon nanowire arrays defined by nanoimprint can work as conductor channels to enhance the sensing ability of dualgate transistor sensors. Nanoimprint and selectivearea movpe for growth of gaas.
Generic nanoimprint process for fabrication of nanowire arrays arxiv. Many adverse effects have been associated with chemical synthesis methods due to the presence of some toxic chemical absorbed on the surface. First, we see that heat treating the growth substrate prior to nanoimprint lithography improves pattern preservation. Nanowire arrays defined by nanoimprint lithography nano. Silicon nanowire arrays defined by nanoimprint can work as conductor channels to enhance the sensing ability of dualgate transistor sensors 14. We demonstrated a novel, simple, and lowcost method to fabricate silicon nanowire sinw arrays and silicon nanohole sinh arrays based on thin silver ag film dewetting process combined with metalassisted chemical etching. Periodic photoresist patterns have been fabricated by laser interference lithography over a wafer. Nanowire arrays defined by nanoimprint lithography. Generic nanoimprint process for fabrication of nanowire arrays. The structures are used as an etching mask for the subsequent reactive.
Nanoimprint lithography nil has been well recognised as a mechanism capable of facilitating the accurate replication of etched electron beam lithography ebl patterns at high speed, by transferring millions of nanofeatures in unison 18. Nanostructures are currently being investigated for nextgeneration photovoltaic pv architectures as a means of lowering cost through the use of abundant materials or to improve light trapping. Nanoimprint lithography can be used as an alternative for. They allow the fabrication of nanometer sized structures, but are usually limited in. Nanoimprint lithography patterning of resists using. Here, we explore three different strategies to improve pattern preservation of largearea catalyst particle arrays defined by nanoimprint lithography for nanowire. Inp nanowire arrays by soft nanoimprint lithography. The nanoimprint lithography nil is a novel method of fabricating micronanometer scale. Ingaas nanowire nw arrays have emerged as important active materials in future photovoltaic and photodetector applications, due to their excellent electronic properties and tunable band gap.
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